发明名称 DEVICE MANUFACTURING METHOD FOR PROVIDING MAXIMIZED THROUGHPUT AND PRODUCING DEVICE OF HIGH QUALITY, DEVICE OBTAINED THEREBY, AND COMPUTER PROGRAM, LITHOGRAPHIC APPARATUS, ROBOT ENGINEERING SYSTEM AND OPTIMAL TIME VALUE CALCULATOR FOR IMPLEMENTING THE SAME METHOD
摘要 PURPOSE: Provided are a device manufacturing method, which gives the maximized throughput and produces devices of high quality in a systematic way, and a device obtained by the method. CONSTITUTION: The device manufacturing method comprises the steps of: providing radiation beams(6) by using a radiation system(4); projecting the radiation beams(6) onto a radiation-sensitive substrate(10); and assigning a locus of movement to the radiation beams including the position and/or direction followed by the substrate(10) as a function of time. In the method, the locus is a mathematically even function up to at least the third order connecting a first state to a second state. Both of the first and the second states include at least the boundary values to the position and/or direction, and the boundary values to the primary and secondary derivatives of the position and/or direction. The method further comprises a step of assigning a locus for making the shortest connection between the first state and the second state, wherein the primary, secondary and the tertiary derivatives are controlled by predetermined values.
申请公布号 KR20040076616(A) 申请公布日期 2004.09.01
申请号 KR20040012094 申请日期 2004.02.24
申请人 ASML NETHERLANDS B.V. 发明人 VANDERSANDE JORIS JAN
分类号 G03F7/20;G05B19/416;H01L21/027;(IPC1-7):G03F7/20 主分类号 G03F7/20
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