发明名称 |
Vertical field effect transistor having a high withstand voltage |
摘要 |
It is intended to provide a high withstand voltage vertical field effect type semiconductor device that relaxes electric fields in a semiconductor substrate without thickening thickness of a drift region and achieves withstand-ability against high voltage without sacrificing ON-voltage, switch-OFF characteristics, and miniaturization. A field effect type semiconductor device comprises emitter regions (100,104) and gate electrodes (106) and the like on a surface (upper surface in FIG.2), a collector region (101) and the like on the other surface (lo - -type field dispersion regions (111) of low impurity concentration are arranged between P-type body regions (103) facing to gate electrodes (106) and an N-type drift region (102) below P-type body regions (103). Thereby, the electric field between collector and emitter is relaxed and a high withstand voltage field effect type semiconductor device is realized. Another field dispersion region can be arranged between the N-type drift region (102) and P + -type collector region (101) below the N-type drift region (102).
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申请公布号 |
EP1453105(A2) |
申请公布日期 |
2004.09.01 |
申请号 |
EP20040003866 |
申请日期 |
2004.02.20 |
申请人 |
TOYOTA JIDOSHA KABUSHIKI KAISHA |
发明人 |
NISHIWAKI, KATSUHIKO;KUSHIDA, TOMOYOSHI;KAWAJI, SACHIKO |
分类号 |
H01L29/739;H01L29/78;H01L21/331;H01L29/06;H01L29/08;(IPC1-7):H01L29/78 |
主分类号 |
H01L29/739 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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