发明名称 Vertical field effect transistor having a high withstand voltage
摘要 It is intended to provide a high withstand voltage vertical field effect type semiconductor device that relaxes electric fields in a semiconductor substrate without thickening thickness of a drift region and achieves withstand-ability against high voltage without sacrificing ON-voltage, switch-OFF characteristics, and miniaturization. A field effect type semiconductor device comprises emitter regions (100,104) and gate electrodes (106) and the like on a surface (upper surface in FIG.2), a collector region (101) and the like on the other surface (lo - -type field dispersion regions (111) of low impurity concentration are arranged between P-type body regions (103) facing to gate electrodes (106) and an N-type drift region (102) below P-type body regions (103). Thereby, the electric field between collector and emitter is relaxed and a high withstand voltage field effect type semiconductor device is realized. Another field dispersion region can be arranged between the N-type drift region (102) and P + -type collector region (101) below the N-type drift region (102).
申请公布号 EP1453105(A2) 申请公布日期 2004.09.01
申请号 EP20040003866 申请日期 2004.02.20
申请人 TOYOTA JIDOSHA KABUSHIKI KAISHA 发明人 NISHIWAKI, KATSUHIKO;KUSHIDA, TOMOYOSHI;KAWAJI, SACHIKO
分类号 H01L29/739;H01L29/78;H01L21/331;H01L29/06;H01L29/08;(IPC1-7):H01L29/78 主分类号 H01L29/739
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