POSITIVE PHOTOSENSITIVE COMPOSITION AND FORMING METHOD OF PATTERN USING THE COMPOSITION TO PREVENT DEFORMATION OF PATTERN WHEN THERMOSETTING PATTERN IS FORMED

摘要

PURPOSE: A positive photosensitive composition and a method for forming a pattern by using the composition are provided, to prevent the deformation of a pattern of an insulating layer when a thermosetting pattern is formed. CONSTITUTION: The positive photosensitive composition comprises a quinonediazide compound; a novolac resin; a compound which reacts with a novolac resin by the action of an acid; and a compound which generates an acid by heat. Preferably the compound which generates an acid by heat is a compound which is degraded at 80-20 deg.C to generate an acid; and the compound which reacts with a novolac resin by the action of an acid is at least one kind of compound selected from the compounds represented by the formula 1 and 2, wherein R1 to R6 are independently a monovalent organic group of C1-C20; R7 to R10 are independently a monovalent organic group of C1-C20; and R11 and R12 are independently H or a monovalent organic group of C1-C20.