发明名称 |
PARTIALLY EXCHANGEABLE ARC CHAMBER TOP PLATE OF ION IMPLANTATION EQUIPMENT |
摘要 |
PURPOSE: A partially exchangeable arc chamber top plate of ion implantation equipment is provided to remarkably reduce maintenance cost by replacing only an inner top plate having a top plate hole. CONSTITUTION: A top plate hole(130) through which extracted ions pass is formed in the center of the inner top plate(140). At least one coupling hole is formed at the end of both sides of the inner top plate confronting each other. A placement end is formed in the lower part of the inner top plate, introduced inward. A placement protrusion that protrudes inward and has a coupling groove corresponding to the coupling hole is formed in the lower part of an outer top plate(110). A coupling member(120) passes through a coupling hole of the inner top plate to be connected to the coupling groove of the outer top plate, connecting the inner top plate with the outer top plate. A source head arc chamber top plate includes the inner top plate, the outer top plate and the coupling member.
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申请公布号 |
KR20040076128(A) |
申请公布日期 |
2004.08.31 |
申请号 |
KR20030011474 |
申请日期 |
2003.02.24 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
CHA, JU CHAN |
分类号 |
H01L21/265;(IPC1-7):H01L21/265 |
主分类号 |
H01L21/265 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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