发明名称 |
Electron projection lithography apparatus using secondary electrons |
摘要 |
An electron projection lithography apparatus using secondary electrons includes a secondary electron emitter which is spaced apart from a substrate holder by a first predetermined interval and has a patterned mask formed on a surface thereof to face the substrate holder, a primary electron emitter which is spaced apart by a second predetermined interval from the secondary electron emitter in a direction opposite to the substrate holder and emits primary electrons to the secondary electron emitter, a second power supply which applies a second predetermined voltage between the substrate holder and the secondary electron emitter, a first power supply which applies a first predetermined voltage between the secondary electron emitter and the primary electron emitter, and a magnetic field generator which controls a path of secondary electrons emitted from the secondary electron emitter.
|
申请公布号 |
US6784438(B2) |
申请公布日期 |
2004.08.31 |
申请号 |
US20030688953 |
申请日期 |
2003.10.21 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
YOO IN-KYEONG;MOON CHANG-WOOK;KIM DONG-WOOK |
分类号 |
G03F7/20;H01J1/00;H01J31/00;H01J37/073;H01J37/147;H01J37/305;H01J37/317;H01L21/027;(IPC1-7):H01J37/073 |
主分类号 |
G03F7/20 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|