发明名称 Microelectronic die including low RC under-layer interconnects
摘要 A microelectronic die comprises a first area, a second area and an under-layer of conductive material formed in the second area to interconnect components. A method of making a microelectronic die comprises forming a layer of insulative material on a substrate; forming at least one trench in the layer of insulative material; and forming at least one line of conductive material in each of the at least one trenches to transmit signals.
申请公布号 US6784026(B2) 申请公布日期 2004.08.31
申请号 US20030428449 申请日期 2003.04.30
申请人 MICRON TECHNOLOGY, INC. 发明人 PARKS JAY S.
分类号 H01L21/8242;H01L23/522;H01L23/528;(IPC1-7):H01L21/44 主分类号 H01L21/8242
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