CATOPTRIC PROJECTION OPTICAL SYSTEM USING ULTRAVIOLET AND EXTREME ULTRAVIOLET LIGHT TO EXPOSE OBJECT

摘要

PURPOSE: A catoptric projection optical system using ultraviolet and extreme ultraviolet light to expose an object is provided to obtain a high NA and performed excellent imaging performance by providing a six-mirror catoptric projection optical system. CONSTITUTION: A catoptric projection optical system is used for projecting a pattern on an object surface onto an image surface. The catoptric projection optical system includes plural mirrors(M1-M6). A second mirror from the image surface through the optical path receives convergent pencil of rays and has a paraxial magnification equal to or less than -0.14. The catoptric projection optical system includes 6 or more mirrors.