PROJECTION EXPOSURE SYSTEM HAVING TEMPERATURE CONTROL UNIT

摘要

PURPOSE: A projection exposure system having a temperature control unit is provided to maintain constantly temperature of a process chamber by using a backup cooler connected to the process chamber through a temperature control unit. CONSTITUTION: A process chamber(101) includes an internal space for performing an exposure process. A temperature control unit(107) is connected to the process chamber. A temperature control fan is installed in the inside of the process chamber. A backup cooler(109) is connected to the process chamber through the temperature control unit. A light emitting unit(102) is installed in the inside of the process chamber in order to emit the predetermined beams. A wafer chuck(103) is installed in the inside of the process chamber under the light emitting unit. A mask frame(105) is arranged between the light emitting unit and the wafer chuck in order to load a photo mask.