摘要 |
A METHOD FOR PLANARIZING OR POLISHING A MEMORY OR RIGID DISK IS PROVIDED. THE METHOD COMPRISES ABRADING AT LEAST A PORTION OF THE SURFACE WITH A POLISHING SYSTEM COMPRISING (I) A POLISHING COMPOSITION COMPRISING WATER, AN OXIDIZING AGENT, AND A COMPLEXING AGENT SELECTED FROM THE GROUP CONSISTING OF AMMONIA, HALIDE IONS, AND MIXTURES THEREOF, AND (II) A POLISHING PAD AND/OR AN ABRASIVE.
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