| 摘要 |
The compound of formula (I) is used in the manufacture of a medicament for the prevention and treatment of schizophrenia wherein: Het is an oxadiazolyl group; R1 is H, lower alkyl, cyclo-lower alkyl, trifluromethyl group, lower alkenyl, lower alkynyl, lower alkoxy group, lower alkoxy-lower alkyl group, hydroxy-lower alkyl group, or an optionally substituted aryl or heteroaryl group; R2 is H, lower alkyl group, cyclo-lower alkyl group, cyclo-lower alkylmethyl group, lower alkenyl group, cyclo-lower alkenyl group, lower alkynyl group, optionally substituted aryl or heteroaryl group.
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