| 摘要 |
FIELD: production of embossed articles. ^ SUBSTANCE: apparatuses have cylindrical rotating patterns, air lances arranged in cylindrical rotating patterns and adapted for directing air flow through openings in pattern onto surface of material subjected to embossment. Apparatuses also include at least one pattern stabilizer made and positioned in apparatus so as to impart force to pattern during operation thereof, said force being sufficient for reducing, preferably, for substantially eliminating fluctuations of gap separating surface of material subjected to embossment process from pattern surface part facing material under embossment process, said part being arranged immediately in the vicinity of material during rotation of pattern. Method involves providing embossed patterns with extremely high number of small parts with distinct transition portions between surfaces of material subjected to embossment process and portions not subjected to embossment process. Method and apparatuses provide for insignificant number of defective formations and high extent of uniformity through the width of embossed material as compared to results obtained with the use of known aerodynamic embosser equipment. ^ EFFECT: increased efficiency of method and apparatuses, improved quality of embossed articles, in particular, articles with reproduced pattern having small parts. ^ 45 cl, 39 dwg |
