发明名称 WAFER PLANARIZATION APPARATUS AND PLANARIZATION METHOD THEREOF
摘要 Wafers (26) are prevented from getting damaged on delivery thereof from a sucking and carrying device to a table (48, 52, 54). A wafer (26) before planarization sucked and held by a sucking board (68, 80) is positioned above a table (48, 52, 54). Next, wafer (26) is vacuum-attracted by the table (48, 52, 54), and the table (48, 52, 54) is moved upward by that attraction power in a direction to suck the wafer (26) so as to vacuum-suck it on the table (48, 52, 54). Subsequently, the wafer (26) is sucked and held only by the table (48, 52, 54) by releasing the sucking and holding thereof by the sucking board (68, 80). <IMAGE>
申请公布号 SG105536(A1) 申请公布日期 2004.08.27
申请号 SG20020000740 申请日期 2002.02.07
申请人 TOKYO SEIMITSU CO., LTD. 发明人 ISAMU KAWASHIMA
分类号 B24B37/04;B25B11/00;B65G49/07;H01L21/304;H01L21/677;H01L21/683;(IPC1-7):B24B37/04 主分类号 B24B37/04
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