| 摘要 |
PURPOSE: A CVD apparatus and a fabricating method thereof are provided to reduce the mechanical shock due to the mis-alignment by inserting an alignment pin into an insertion part of a bushing. CONSTITUTION: A vacuum chamber(116) includes a gas inflow hole(112) and a gas outflow hole(114). A susceptor(120) is installed in the inside of the vacuum chamber. A substrate is loaded on the susceptor. A chamber bottom wall(137) is used for surrounding the outside of the susceptor. A bushing(140) is installed at an edge of the chamber bottom wall. An alignment pin is inserted into an insertion part of the bushing. A shadow frame(130) includes an alignment pin(131). The shadow frame is used for covering an edge of the substrate loaded on the susceptor.
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