发明名称 |
Method for inspection of periodic grating structures on lithography masks |
摘要 |
The invention relates to a method for inspection of periodic structures on lithography masks using a microscope with adjustable illumination and an operating element for movement of a mechanical stage with the lithography mask attached to it in order to record images of the lithography mask at a computer-controlled location on the lithography mask. The position, the size and the pitch specification of the lithography mask are stored.
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申请公布号 |
US2004165763(A1) |
申请公布日期 |
2004.08.26 |
申请号 |
US20030735414 |
申请日期 |
2003.12.12 |
申请人 |
DETTMANN WOLFGANG;KOEHLE RODERICK;VERBEEK MARTIN |
发明人 |
DETTMANN WOLFGANG;KOEHLE RODERICK;VERBEEK MARTIN |
分类号 |
G03F1/00;(IPC1-7):G06K9/00 |
主分类号 |
G03F1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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