发明名称 PATCH AND METHOD FOR SANDBLAST PROCESS CONTROL, AND BACK FACE PLATE OF PLASMA DISPLAY PANEL IN WHICH THE PATCH IS FORMED
摘要 PROBLEM TO BE SOLVED: To simply and shortly determine whether a process condition at the time of producing in a sandblast process is suitable. SOLUTION: This patch for sandblast process control which is a patch out of the same material simultaneously with the partition in the sandblast process forming a partition in the back face plate of the plasma display panel, comprises a pattern of the shape of a plurality of kinds of stripes having different widths or intervals. This invention comprises a sandblast process control method using the patch and the back face plate of the plasma display panel in which the patch is formed. COPYRIGHT: (C)2004,JPO&NCIPI
申请公布号 JP2004241334(A) 申请公布日期 2004.08.26
申请号 JP20030031821 申请日期 2003.02.10
申请人 DAINIPPON PRINTING CO LTD 发明人 HATA NAOKI;NISHIDA MASASHI;SOEDA MASAHIKO;SAITO HIROSHI
分类号 B24C1/00;H01J9/02;H01J9/24;H01J11/22;H01J11/34;H01J11/36;H04N5/64;(IPC1-7):H01J9/24;H01J11/02 主分类号 B24C1/00
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