发明名称 |
Method of controlling the differential dissolution rate of photoresist compositions, polycyclic olefin polymers and monomers used for making such polymers |
摘要 |
A photoresist composition encompassing a polymer having at least one polycyclic olefin repeat unit having a desired exo mole percent is provided, where the repeat unit is derived from a polycyclic olefin monomer having the desired exo mole percent. Such polymers having such repeat units having a desired exo mole percent offer control of differential dissolution rate and hence provide enhanced imaging properties. Exemplary monomers having a desired exo mole percent are also provided
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申请公布号 |
US2004166436(A1) |
申请公布日期 |
2004.08.26 |
申请号 |
US20040783174 |
申请日期 |
2004.02.20 |
申请人 |
RHODES LARRY F.;CHANG CHUN;LANGSDORF LEAH J.;SIDAWAY HOWARD A.;ITO HIROSHI |
发明人 |
RHODES LARRY F.;CHANG CHUN;LANGSDORF LEAH J.;SIDAWAY HOWARD A.;ITO HIROSHI |
分类号 |
G03F7/039;G03F7/30;(IPC1-7):G03F7/038 |
主分类号 |
G03F7/039 |
代理机构 |
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代理人 |
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地址 |
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