Method and apparatus for reducing particle contamination

摘要

A method and device for gradually equalizing air or gas pressures between substrate processing chambers prior to transfer of a substrate between the chambers. The device comprises a gas flow restrictor provided in the chamber wall that separates the chambers. A door typically reversibly seals the gas flow restrictor. During substrate processing in one of the chambers, the gas flow restrictor is sealed to maintain a partial vacuum pressure in the chamber. Prior to opening the wafer transfer gate between the chambers, the gas flow restrictor door is opened to facilitate the gradual flow of air or gas from the higher-pressure chamber, through the gas flow restrictor to the lower-pressure chamber and substantially equalize the pressures in the respective chambers.