发明名称 SUBSTRATE FOR VERTICAL ALIGNMENT AND PROCESS FOR PRODUCING VERTICALLY ALIGNED LIQUID CRYSTAL RETARDATION FILM
摘要 <p>An alignment substrate capable of forming a vertically aligned liquid crystal retardation film through simple procedure without need to carry out special treatment; and a process for producing a vertically aligned liquid crystal retardation film with the use of the alignment substrate. Vertical alignment of a liquid crystal compound can be effected by providing a substrate for vertical alignment comprising a layer of inorganic substance and, superimposed on a surface thereof, a layer of acrylic polymer and applying a layer of liquid crystal compound on the substrate by coating operation, etc.</p>
申请公布号 WO2004072699(A1) 申请公布日期 2004.08.26
申请号 WO2004JP01043 申请日期 2004.02.03
申请人 NIPPON KAYAKU KABUSHIKI KAISHA;POLATECHNO CO., LTD.;TANAKA, KOUICHI 发明人 TANAKA, KOUICHI
分类号 G02B5/30;G02F1/1337;(IPC1-7):G02B5/30;G02F1/133 主分类号 G02B5/30
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