发明名称 Liquid-phase growth method, liquid-phase growth apparatus, and solar cell
摘要 The present invention provides a method for producing a semiconductor substrate which comprises the steps of growing a first semiconductor layer on a substrate in liquid phase at a properly controlled temperature for eliminating defects and growing a second semiconductor layer on the first semiconductor layer in liquid phase at a higher temperature; a solar cell produced by a method comprising a step of anodizing the surface of the first and second layer side of the semiconductor substrate produced by the liquid-phase growth method; a liquid-phase growth apparatus comprising means for storing a melt, means for changing the temperature of the stored melt, and means for bringing an oxygen-containing substrate into contact with the melt, wherein a substrate is brought into contact with the melt at a temperature so as to suppress the stacking faults contained in the semiconductor layer grown on the surface of the substrate. <IMAGE> <IMAGE>
申请公布号 AU776096(B2) 申请公布日期 2004.08.26
申请号 AU20000061262 申请日期 2000.09.22
申请人 CANON KABUSHIKI KAISHA 发明人 KATSUMI NAKAGAWA;SHOJI NISHIDA
分类号 H01L31/04;C30B19/02;C30B19/06;H01L21/20;H01L21/208 主分类号 H01L31/04
代理机构 代理人
主权项
地址