发明名称 HOT ELECTRON TRANSISTOR AND MANUFACTURING METHOD THEREFOR
摘要 PROBLEM TO BE SOLVED: To improve electrical characteristics of a hot electron transistor where an active layer is formed of an intrinsic semiconductor. SOLUTION: The hot electron transistor is provided with a source electrode and a drain electrode, a hot electron creation layer and an intrinsic semiconductor region which are arranged in a track of a conduction electron between the source electrode and the drain electrode, a gate electrode for controlling voltage of the intrinsic semiconductor region, a first leakage current suppression layer which is installed in a path of a leakage current between the source electrode and the gate electrode and whose band gap is wider than the intrinsic semiconductor region, and a second leakage current suppression layer which is installed in a path of leakage current between the drain electrode and the gate electrode and whose band gap is wider than the intrinsic semiconductor region. Since the undesirable current route is interrupted by the first leakage current suppression layer and the second leakage current suppression layer, the electrical characteristics of the hot electron transistor can be improved. COPYRIGHT: (C)2004,JPO&NCIPI
申请公布号 JP2004241502(A) 申请公布日期 2004.08.26
申请号 JP20030027462 申请日期 2003.02.04
申请人 RIKOGAKU SHINKOKAI 发明人 MIYAMOTO YASUYUKI;MAEDA HIROSHI;TAKEUCHI KATSUHIKO
分类号 H01L29/80;(IPC1-7):H01L29/80 主分类号 H01L29/80
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