Coating agent, plasma-resistant component having coating film formed by the coating agent, plasma processing device provided with the plasma-resistant component

摘要

With a coating-film-forming coating agent 51 used as a resist including a main component such as cyclorubber-bisazide and a photosensitive component, by immersing deposits 52 deposited on the coating film of the coating agent 51 formed on an in-chamber component 50 in a release liquid such as acetone together with the in-chamber component 50 removed from within a chamber 22, the deposits 52 attached to the coating film can be removed along with the coating film from the in-chamber component 50 concurrently with the release of the coating film.