AMORPHOUS CARBON FILM FORMING METHOD AND DEVICE

摘要

An amorphous carbon film forming device is characterized by comprising a film forming furnace (11), a plurality of work fixing tools (23) which parallelly holds a plurality of plate-like workpieces (22) in a vertically spaced manner with the distance between two adjacent plate-like workpieces (22) being in the range of 2-30 mm and which are annularly disposed in the furnace chamber of the film forming furnace (11) at equal intervals and are electrically connected to a minus electrode, supply gas supplying nozzles (31, 32), one or more of which are disposed in the centers of the annularly disposed work fixing tools (23), the rest being annularly disposed at equal intervals on the centrifugal side, and a plasma power source (16) connected at least to the work fixing tools (23). Stabilized electric discharge is obtained by operating the plasma power source so that the supply gas pressure range is in 13-1330 Pa and the sheath width is 2-30 mm. Thereby, amorphous carbon films can be efficiently formed at low cost.