发明名称 |
METHOD FOR CRYSTALLIZING AND GROWING GALLIUM NITRIDE COMPOUND SEMICONDUCTOR LAYER |
摘要 |
PURPOSE: A method for crystallizing and growing a gallium nitride compound semiconductor layer is provided to enhance light emission efficiency of an optical device by reducing crystalline defects. CONSTITUTION: The first gallium nitride compound semiconductor layer(3) includes In and Ga. The second gallium nitride compound semiconductor layer(2) and the third gallium nitride compound semiconductor layer(4) are formed on the first and the second sides of the gallium nitride compound semiconductor layer. Each composition of the second and the third gallium nitride compound semiconductor layer is different from the composition of the first gallium nitride compound semiconductor layer. One side of both sides of the first gallium nitride compound semiconductor layer is grown like a shape of a horn.
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申请公布号 |
KR20040074685(A) |
申请公布日期 |
2004.08.26 |
申请号 |
KR20030010056 |
申请日期 |
2003.02.18 |
申请人 |
NINEX CO., LTD. |
发明人 |
KIM, BONG JIN |
分类号 |
H01L21/20;(IPC1-7):H01L21/20 |
主分类号 |
H01L21/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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