发明名称 |
METHOD OF DEPOSITING DLC ON SUBSTRATE |
摘要 |
Durability and/or longevity of a diamond-like carbon (DLC) layer can be improved by varying the voltage and/or ion energy used to ion beam deposit t he DLC layer. For example, a relatively low voltage may be used to ion beam deposit a first portion of the DLC layer on the substrate (Figure 2A), and thereafter a second higher voltage(s) (Figure 2B) used to ion beam deposit a second higher density portion of the DLC layer over the first portion of the DLC layer. In such a manner, ion mixing at the bottom of the DLC layer can b e reduced, and the longevity and/or durability of the DLC improved. |
申请公布号 |
CA2513935(A1) |
申请公布日期 |
2004.08.26 |
申请号 |
CA20042513935 |
申请日期 |
2004.02.04 |
申请人 |
GUARDIAN INDUSTRIES CORP. |
发明人 |
VEERASAMY, VIJAYEN S.;THOMSEN, SCOTT V. |
分类号 |
C23C14/06;C23C14/22;(IPC1-7):C23C16/26 |
主分类号 |
C23C14/06 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|