发明名称 PHOTOSENSITIVE RESIN COMPOSITION
摘要 <P>PROBLEM TO BE SOLVED: To provide a photosensitive rein composition which produces little residue at development removing part to enable a pixel having excellent flatness to be manufactured from the composition and little contaminates a baking furnace. <P>SOLUTION: The photosensitive resin composition has a binder resin (b), a photopolymerizable compound (c), a photopolymerization initiator (d), a solvent (f) and at least one kind of monomer from which the constituent of the binder resin (b) is derived, wherein the monomer is contained in a mass fraction of 0.010 to 0.16% by mass to the solid content of the photosensitive resin composition. <P>COPYRIGHT: (C)2004,JPO&NCIPI
申请公布号 JP2004240416(A) 申请公布日期 2004.08.26
申请号 JP20040006401 申请日期 2004.01.14
申请人 SUMITOMO CHEM CO LTD 发明人 ICHIKAWA KOJI
分类号 G03F7/004;C08F291/00;G02B5/20;G03F7/033;G03F7/26 主分类号 G03F7/004
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