| 摘要 |
PROBLEM TO BE SOLVED: To provide a method of simply and finely producing a nanostructure with a rugged structure by utilizing self-organizationally diverged fine pores. SOLUTION: The method of producing a nanostructure comprises: a stage wherein a plurality of regularly arranged recesses are formed on a substrate; a stage wherein, as to fine pores formed by the subsequent anodic oxidation, at least a part of the fine pores is self-organizationally diverged; and a stage wherein the parts before the divergence in the fine pores are removed. Further, the method comprises a stage wherein, after the formation of the fine pores, projections are formed from a base layer provided below the film to be subjected to anodic oxidation into the fine pores. COPYRIGHT: (C)2004,JPO&NCIPI
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