| 发明名称 |
Mask and its manufacturing method, exposure, and device fabrication method |
| 摘要 |
A mask arranges a predetermined pattern and an auxiliary pattern smaller than the predetermined pattern so that where a virtual lattice is assumed which has a lattice point located at a center of the predetermined pattern, a center of the auxiliary pattern is offset from the lattice point of the virtual lattice.
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| 申请公布号 |
US2004166422(A1) |
申请公布日期 |
2004.08.26 |
| 申请号 |
US20040783218 |
申请日期 |
2004.02.20 |
| 申请人 |
YAMAZOE KENJI;SUZUKI AKIYOSHI;SAITOH KENJI |
发明人 |
YAMAZOE KENJI;SUZUKI AKIYOSHI;SAITOH KENJI |
| 分类号 |
H01L21/027;G03F1/00;G03F1/14;(IPC1-7):G03C5/00;G03F9/00;G03B27/42 |
主分类号 |
H01L21/027 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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