发明名称 SULFONYLOXYIMIDE RADIATION-SENSITIVE ACID GENERATOR HAVING SENSITIZED MOIETY AND POSITIVE RADIATION-SENSITIVE RESIN COMPOSITION USING SAME
摘要 <P>PROBLEM TO BE SOLVED: To provide a new radiation-sensitive acid generator having excellent storage stability, high transparency for radiation and high sensitivity, and to provide a positive radiation-sensitive resin composition containing the above radiation-sensitive acid generator and being excellent in the storage stability, sensitivity, resolution, pattern profile and so on. <P>SOLUTION: The radiation-sensitive acid generator contains at least one kind of sulfonyloxyimide compound having such a structure that an aromatic hydrocarbon group having an electron donating group and/or a heterocyclic group having an electron donating group is bonded to the skeleton having a sulfonyloxyimide group and that the electron donating group is bonded in the moiety of the electron donating atom with the aromatic ring in the aromatic hydrocarbon group or with the heterocycle in the heterocyclic group. The positive radiation-sensitive resin composition contains the above radiation-sensitive acid generator and an acid dissociating group-containing resin. <P>COPYRIGHT: (C)2004,JPO&NCIPI
申请公布号 JP2004240170(A) 申请公布日期 2004.08.26
申请号 JP20030029273 申请日期 2003.02.06
申请人 JSR CORP 发明人 YONEDA EIJI;O ISAMU
分类号 G03F7/004;C09K3/00;G03F7/039;H01L21/027 主分类号 G03F7/004
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