Enhancing light coupling efficiency for ultra high numerical aperture lithography through first order transmission optimization

摘要

A first order transmission optimization (FOTO) top coat may be provided on a photoresist layer to improve the coupling efficiency of first order diffracted light waves during a lithographic imaging operation. The top coat may be a relatively thin layer of a relatively low absorption, low refractive index material. The top coat may be provided in addition to a bottom anti-reflective coating (BARC).