发明名称 |
Arrangement for debris reduction in a radiation source based on a plasma |
摘要 |
The invention is directed to an arrangement for debris reduction in a radiation source based on a plasma, particularly for generating bundled radiation in the extreme ultraviolet (EUV) spectral region. The object of the invention, to find a novel possibility for beam shaping and debris reduction in a radiation source based on a plasma which substantially increases the life of collector optics without having to tolerate a substantial reduction in transparency or a sudden destruction of the protective mechanism, is met according to the invention in that exchangeable additional optics are arranged in the radiation path between a conventional debris filter and the collector optics, wherein a distance-increasing intermediate imaging of the source location relative to the collector optics is provided by the additional optics for further debris reduction.
|
申请公布号 |
US2004165171(A1) |
申请公布日期 |
2004.08.26 |
申请号 |
US20040784438 |
申请日期 |
2004.02.23 |
申请人 |
TRAN DUC CHINH;KLEINSCHMIDT JUERGEN |
发明人 |
TRAN DUC CHINH;KLEINSCHMIDT JUERGEN |
分类号 |
G03B27/72;G03F7/20;(IPC1-7):G03B27/72 |
主分类号 |
G03B27/72 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|