发明名称 |
ASYMMETRICAL MOSFET LAYOUT FOR LARGE CURRENT HIGH-SPEED OPERATION |
摘要 |
PROBLEM TO BE SOLVED: To provide the structure of a field effect transistor which can deal with a large current and is adapted to a high-speed operation, and to provide a method therefor. SOLUTION: The structure of the field effect transistor which can deal with the large current includes an interleaved source diffusion region and a drain diffusion region having a drain diffusion contact to a first metal level only in the case of drain diffusion in the drain diffusion. A second metal level covers the entire width of a device. A current flows mainly in a direction perpendicular to a source. The method therefor is provided. COPYRIGHT: (C)2004,JPO&NCIPI |
申请公布号 |
JP2004241448(A) |
申请公布日期 |
2004.08.26 |
申请号 |
JP20030026586 |
申请日期 |
2003.02.04 |
申请人 |
INTERNATL BUSINESS MACH CORP <IBM> |
发明人 |
PARKER SCOTT M;TANGHE STEVEN J |
分类号 |
H01L21/3205;H01L23/52;H01L29/78;(IPC1-7):H01L29/78;H01L21/320 |
主分类号 |
H01L21/3205 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|