发明名称 ASYMMETRICAL MOSFET LAYOUT FOR LARGE CURRENT HIGH-SPEED OPERATION
摘要 PROBLEM TO BE SOLVED: To provide the structure of a field effect transistor which can deal with a large current and is adapted to a high-speed operation, and to provide a method therefor. SOLUTION: The structure of the field effect transistor which can deal with the large current includes an interleaved source diffusion region and a drain diffusion region having a drain diffusion contact to a first metal level only in the case of drain diffusion in the drain diffusion. A second metal level covers the entire width of a device. A current flows mainly in a direction perpendicular to a source. The method therefor is provided. COPYRIGHT: (C)2004,JPO&NCIPI
申请公布号 JP2004241448(A) 申请公布日期 2004.08.26
申请号 JP20030026586 申请日期 2003.02.04
申请人 INTERNATL BUSINESS MACH CORP <IBM> 发明人 PARKER SCOTT M;TANGHE STEVEN J
分类号 H01L21/3205;H01L23/52;H01L29/78;(IPC1-7):H01L29/78;H01L21/320 主分类号 H01L21/3205
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