ETCHING METHOD FOR TRANSPARENT CONDUCTIVE SUBSTRATE, AND SUBSTRATE MANUFACTURED BY THE SAME

摘要

PROBLEM TO BE SOLVED: To provide a method for etching a transparent conductive substrate which reduces the residue in a process of removing a resist in an alkaline solution. SOLUTION: For pattern gaps of 200μm or more, etching is performed using a resist ink with components thereof soluble in the alkaline solution of 94 wt.% or more. COPYRIGHT: (C)2004,JPO&NCIPI