发明名称 Gas scrubbing reagent and methods for using same
摘要 A reagent composition for removing a contaminant from a gas. The reagent composition contains (1) a silicate compound; (2) a sequestrant; and optionally a surfactant. The reagent composition may be used in methods to remove contaminants from gases. The reagent composition in combination with micro/miniature mechanical structures provides for reduced back pressure and reduced volume of the reaction chamber.
申请公布号 US2004166043(A1) 申请公布日期 2004.08.26
申请号 US20040784742 申请日期 2004.02.24
申请人 VANDINE ROBERT W.;CAMPO ANTHONY S.;FOSTER DWIGHT R. 发明人 VANDINE ROBERT W.;CAMPO ANTHONY S.;FOSTER DWIGHT R.
分类号 B01D53/50;B01D53/52;B01D53/56;B01D53/62;B01D53/64;B01D53/70;B01D53/72;(IPC1-7):B01J20/10 主分类号 B01D53/50
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