发明名称 |
Gas scrubbing reagent and methods for using same |
摘要 |
A reagent composition for removing a contaminant from a gas. The reagent composition contains (1) a silicate compound; (2) a sequestrant; and optionally a surfactant. The reagent composition may be used in methods to remove contaminants from gases. The reagent composition in combination with micro/miniature mechanical structures provides for reduced back pressure and reduced volume of the reaction chamber.
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申请公布号 |
US2004166043(A1) |
申请公布日期 |
2004.08.26 |
申请号 |
US20040784742 |
申请日期 |
2004.02.24 |
申请人 |
VANDINE ROBERT W.;CAMPO ANTHONY S.;FOSTER DWIGHT R. |
发明人 |
VANDINE ROBERT W.;CAMPO ANTHONY S.;FOSTER DWIGHT R. |
分类号 |
B01D53/50;B01D53/52;B01D53/56;B01D53/62;B01D53/64;B01D53/70;B01D53/72;(IPC1-7):B01J20/10 |
主分类号 |
B01D53/50 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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