| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a dust-proofing device which can prevent contamination of a stencil mask due to sticking of dust, etc., and further can prevent distortion of the stencil mask even when the membrane region is enlarged, and to provide a stencil mask with the dust-proofing device, an exposure method using it, a mask inspection method and a defect repairing method. <P>SOLUTION: The exposure method, mask inspection method and defect correcting method are characterised in that both the surfaces of a membrane side and a strut side of the stencil mask are overlaid with a single transparent substrate 1, one by one, and the air between the transparent substrates is exhausted and removed, thereby, the stencil mask and the transparent substrates are pressurized by an outside atmosphere, and the transparent substrate is arranged as the dust-proofing device by holding the overlaid part while tightly sticking. <P>COPYRIGHT: (C)2004,JPO&NCIPI</p> |
