发明名称 |
DEVICE AND METHOD FOR MANAGING FOREIGN MATTER IN VACUUM PROCESSOR |
摘要 |
PROBLEM TO BE SOLVED: To provide a device and a method for managing a foreign matter which can manage occurrence of the foreign matter in a vacuum processor. SOLUTION: A foreign matter managing device in a vacuum processor 100 performing a vacuum processing on a sample 10 is provided with a vacuum processing container 2, a gas supply means 5 for supplying processing gas into the vacuum processing container 2, and a sample stand 9 holding the sample 10 by placing it in the vacuum processing container 2. The foreign matter managing device of the vacuum processor is provided with a foreign matter monitor 6 detecting foreign matters floating in the vacuum processing container, a means 14 for creating device state data showing a state of the vacuum processor, and a data integration managing means 200 for specifying and displaying a part where foreign matter occurrence probability is high based on foreign matter data that the foreign matter monitor 6 detects and on device state data. COPYRIGHT: (C)2004,JPO&NCIPI
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申请公布号 |
JP2004241499(A) |
申请公布日期 |
2004.08.26 |
申请号 |
JP20030027421 |
申请日期 |
2003.02.04 |
申请人 |
HITACHI HIGH-TECHNOLOGIES CORP |
发明人 |
SHIRAISHI DAISUKE;KAGOSHIMA AKIRA;YAMAMOTO HIDEYUKI;ARAI TAKESHI;NAKANO HIROYUKI |
分类号 |
C23C14/00;C23C16/44;C23F4/00;H01J37/32;H01L21/00;H01L21/3065;(IPC1-7):H01L21/306 |
主分类号 |
C23C14/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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