发明名称 INORGANIC OXIDES WITH MESOPOROSITY OR COMBINED MESO- AND MICROPOROSITY AND PROCESS FOR THE PREPARATION THEREOF
摘要 1. A process for producing an inorganic oxide that contains micro- and mesopores, comprising: heating the mixture at a high temperature comprising water, an inorganic oxide and at least one compound that binds to the inorganic oxide by hydrogen bonding, said heating being to a temperature and for a time to produce an organic oxide that contains both micropores and mesopores. 2. The process of Claim 1 wherein said compound is a triethanolamine, sulfolane, tetraethylenepentamine, diethylglycoldibenzonate or a glycol. 3. The process of Claim 1 wherein said compound is a glycol. 4. The process of Claim 1, wherein the mixture further includes a micropore forming agent. 5. The process of Claim 4 wherein said micropore forming agent is a quaternary ammonium salt. 6. The process of Claim 4 wherein the inorganic oxide is an amorphous silicate. 7. The process of Claim 6 wherein the heating includes maintaining the mixture at about the boiling point of water to evaporate water and volatile organics from the inorganic oxide precursor therefrom, followed by calcining at a temperature of above 300 degree C. 8. The process of Claim 3 wherein the glycol has a boiling point of at least 150 degree C. 9. The process of Claim 8 wherein the glycol is selected from the group consisting of glycerol, diethylene glycol, triethylene glycol and tetraethylene glycol. 10. The process of Claim 9 wherein the mixture additionally contains a source of ions selected from the group of IVA, VB, VIB, VIIB, VIII, IB, IIB and IIIA elements. 11. The process of Claim 10 wherein the mixture additionally contains a source of aluminium ions. 12. The process of Claim 1 wherein the inorganic material is a silicate material selected from the group consisting of tetraethylorthosilicate, fumed silica, sodium silicate and silica sol. 13. The process of Claim 1 wherein the inorganic oxide comprises alumina. 14. The process of claim 1 wherein said heating comprises: heating said mixture to about the boiling point of water, whereby water is evaporated from said mixture, and said compound that binds to the inorganic oxide by hydrogen bonding is retained in said mixture; and heating said mixture to a temperature above the boiling point of water and up to the boiling point of said compound which binds to said inorganic oxide by hydrogen bonding, whereby said mesopores and said micropores are formed in said inorganic oxide. 15. The process of claim 14 wherein said compound which binds to said inorganic oxide by hydrogen bonding has a boiling point of at least 150 degree C. 16. The process of claim 1 wherein said inorganic oxide containing both micropores and mesopores includes at least 3 volume percent and not more than 60 volume percent of micropores. 17. A process for producing an inorganic oxide that contains only mesopores and less than 3 volume percent micropores, comprising: heating a mixture containing water, an inorganic oxide and at least one compound that binds to the inorganic oxide by hydrogen bonding, said heating being to a temperature and for a time to produce an inorganic oxide that contains both micropores and mesopores, and hydrothermally heating said inorganic oxide containing both micropores and mesopores to reduce the micropores to less than 3 percent by pore volume of mesopores and micropores. 18. A process for producing an inorganic oxide that contains mesopores and a substantial amount of micropores, comprising: heating a mixture comprising water, an inorganic oxide and at least one compound that binds to the inorganic oxide by hydrogen bonding, said heating being to a temperature below the temperature at which there is substantial formation of mesopores, and removing said at least one compound at a temperature below the temperature at which there is substantial formation of mesopores to produce an inorganic oxide that contains mesopores and a substantial amount of micropores. 19. The process of claim 18 wherein said inorganic oxide containing mesopores and a substantial amount of micropores contain 75 volume percent micropores. 20. A process for producing an inorganic oxide that contains mesopores, comprising: heating a mixture comprising water, an inorganic oxide, and at least one compound that binds to the inorganic oxide by hydrogen bonding, to about the boiling point of water, whereby water is evaporated from said mixture, and said compound that binds to the inorganic oxide by hydrogen bonding is retained in said mixture; and heating said mixture to a temperature above the boiling point of water and up to the boiling point of said compound which binds to said inorganic oxide by hydrogen bonding, whereby said mesopores are formed in said inorganic oxide. 21. The process of claim 20 wherein said compound which binds to said inorganic oxide by hydrogen bonding has a boiling point of at least 150 degree C. 22. A product comprising: a non-crystalline inorganic oxide, said inorganic oxide including micropores and mesopores, wherein said inorganic oxide has one peak in an X-ray diffraction pattern where 2 theta between 0.5 and 2.5 degree and wherein said mesopores are interconnected mesopores. 23. The product of claim 22 wherein said mesopores have a wall-to-wall distance of from 3 nm to 25 nm. 24. The product of claim 22 wherein said inorganic oxide is a silicate. 25. The product of claim 22 wherein said mesopores have a diameter of from 2 to 25 nm. 26. The product of claim 22 wherein the BET surface area is from 50 to 1250 m.<2>/g. 27. The product of claim 22 wherein the pore size distribution of the mesopores produces a pore size distribution plot in which the ratio of the width of the plot at half the height of the plot to the pore size at the maximum height of the plot is no greater than 0.75. 28. A product, comprising: a non-crystalline inorganic oxide, said inorganic oxide including mesopores, wherein said inorganic oxide has one peak in an X-ray diffraction pattern where 2 theta is between 0.5 and 2.5 degree and wherein said mesopores are interconnected mesopores. 29. The product of claim 28 wherein said inorganic oxide has a BET surface area from 50 to 1,250 m<2>/g. 30. The product of claim 28 wherein the pore size distribution of the mesopores produces a pore size distribution plot in which the ratio of the width of plot at half the height of the plot to the pore size at the maximum height of the plot is no greater than 0.75. 31. The product of claim 28 wherein said mesopores have a wall-to-wall distance of from 3 nm to 25 nm. 32. The product of claim 28 wherein said inorganic oxide is a silicate. 33. The product of claim 28 wherein said mesopores have a diameter of from 2 to 25nm.
申请公布号 EA004787(B1) 申请公布日期 2004.08.26
申请号 EA20010000319 申请日期 1999.09.15
申请人 TECHNISCHE UNIVERSITEIT DELFT;ABB LAMMUS GLOBAL INC. 发明人 SHAN, ZHIPING;MASCHMEYER, THOMAS;JANSEN, JACOBUS, CORNELIS
分类号 C01B33/12;C01B33/26;C01B33/46;C01B37/00;C01B37/02;C01B39/02;C01B39/08;(IPC1-7):C01B33/12 主分类号 C01B33/12
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