发明名称 Capacitor and method for fabricating the same and semiconductor device
摘要 A capacitor 19 comprises a lower electrode 14 formed on a substrate 10, an upper electrode 18 opposed to the lower electrode, and a capacitor dielectric film 16 formed between the lower electrode and the upper electrode, in which at least one of the lower electrode and the upper electrodes is an electrode of a metal substituted layer. The lower electrodes of polysilicon are formed, and then after the high-temperature heat processing for improving film quality of the capacitor dielectric film has been performed, the lower electrodes of polysilicon is substituted with aluminum to form the lower electrodes of aluminum, whereby aluminum, which cannot withstand the heat processing for improving film quality of the capacitor dielectric film can be used as a material of the lower electrodes. Thus, capacitors having good high-speed response can be formed.
申请公布号 US2004165335(A1) 申请公布日期 2004.08.26
申请号 US20040784773 申请日期 2004.02.24
申请人 FUJITSU LIMITED 发明人 NAKAMURA SHUJI
分类号 H01L27/04;H01G4/005;H01G4/228;H01L21/02;H01L21/768;H01L21/822;H01L21/8234;H01L21/8242;H01L21/8246;H01L27/06;H01L27/105;H01L27/108;(IPC1-7):H01G4/228 主分类号 H01L27/04
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