发明名称 |
SEMICONDUCTOR-ON-INSULATOR DEVICE AND METHOD OF ITS MANUFACTURE |
摘要 |
A method and apparatus for producing a relatively thin, relatively uniform semiconductor layer which has improved carrier mobility. In an embodiment, a lattice-matched insulator layer is formed on a semiconductor substrate, and a lattice-matched semiconductor layer is formed on the insulator layer to form a relatively thin, relatively uniform semiconductor on insulator apparatus. In embodiments of the method and apparatus, energy band characteristics may be used to facilitate the extraction of the well-region minority carriers. |
申请公布号 |
EP1449242(A2) |
申请公布日期 |
2004.08.25 |
申请号 |
EP20030787307 |
申请日期 |
2003.07.31 |
申请人 |
INTEL CORPORATION |
发明人 |
JIN, BEEN-YIH;ARGHAVANI, REZA;CHAU, ROBERT |
分类号 |
H01L21/762;H01L21/02;H01L21/20 |
主分类号 |
H01L21/762 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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