发明名称 A method and an apparatus for positioning a substrate relative to a support stage
摘要 In a first aspect, a substrate positioning system includes a plurality of pushers arranged in a spaced relation about a stage adapted to support a substrate. Each pusher is adapted to assume a retracted position so as to permit the substrate to be loaded onto and unloaded from the stage, extend toward an edge of the substrate that is supported by the stage, contact the edge of the substrate, and continue extending so as to cause the substrate to move relative to the stage until the substrate is calibrated to the stage. Numerous other aspects are provided. <IMAGE>
申请公布号 EP1450398(A2) 申请公布日期 2004.08.25
申请号 EP20040003863 申请日期 2004.02.20
申请人 APPLIED MATERIALS, INC. 发明人 KURITA, SHINICHI;BEER, EMANUEL
分类号 G02F1/13;G03F7/20;G03F9/00;H01L21/68;H01L21/687;(IPC1-7):H01L21/68 主分类号 G02F1/13
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