发明名称 |
CLEANING METHOD CAPABLE OF PERFORMING EFFECTIVE CLEANING PROCESS ON SUBSTRATE OF MINUTE STRUCTURE |
摘要 |
PURPOSE: A cleaning method is provided to effectively perform a cleaning process on a substrate with a fine structure by performing a simple process using a supercritical fluid. CONSTITUTION: Supercritical fluid to which class 3 amine compound of a predetermined quantity is added as a cleaning solution is used. The supercritical fluid comes in contact with a substrate to clean the substrate having a fine structure. A material of gas state at room temperature and atmospheric pressure and is phase-transited into supercritical fluid as the cleaning solution by controlling temperature and pressure. After the substrate comes in contact with the material of gas state, the material of gas state is directly transited into supercritical fluid without passing through a liquid state.
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申请公布号 |
KR20040074632(A) |
申请公布日期 |
2004.08.25 |
申请号 |
KR20040010890 |
申请日期 |
2004.02.19 |
申请人 |
MITSUBISHI GAS CHEMICAL COMPANY INC.;SONY CORPORATION |
发明人 |
SAGA KOICHIRO;WATANABE HIROYA;AZUMA TOMOYUKI |
分类号 |
H01L21/302;B08B7/00;C11D7/32;C11D17/00;H01L21/00;H01L21/304;(IPC1-7):H01L21/302 |
主分类号 |
H01L21/302 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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