发明名称 |
Recombination center diffusion controlled by carbon concentration |
摘要 |
A localised reduced lifetime region (1,25,41) is provided in a semiconductor device formed substantially of silicon. A predetermined concentration of carbon is provided in the region, and then the body is heated to incorporate a lifetime controlling impurity substantially within the carbon region. It is believed that the association between the impurity ions (M<+>) and the carbon atoms (C) on silicon lattice sites produces C-M<+> complexes with significant capture cross-sections. The carbon may be provided by addition during epitaxial growth of silicon material, during bulk growth of the silicon, or by implantation and/or diffusion.
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申请公布号 |
US6781156(B2) |
申请公布日期 |
2004.08.24 |
申请号 |
US20020315804 |
申请日期 |
2002.12.10 |
申请人 |
KONINKLIJKE PHILIPS ELECTRONICS N.V. |
发明人 |
DROBNIS MIRON;HILL MARTIN J. |
分类号 |
H01L21/331;H01L29/167;H01L29/32;H01L29/732;H01L29/747;H01L29/861;H01L29/868;(IPC1-7):H01L31/031 |
主分类号 |
H01L21/331 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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