| 摘要 |
A semiconductor device includes a semiconductor substrate having a center area where an IC is formed and a peripheral area surrounding the center area, a first wiring pattern formed on the substrate in the center area, a second wiring pattern formed in the peripheral area wherein the second wiring pattern encompasses the center area, a first insulating layer formed over the center and peripheral areas, and a second insulating layer formed on the first insulating layer which is formed on the semiconductor substrate wherein the second insulating layer is not formed over the second wiring pattern.
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