发明名称 Pressure gradient CVI/CVD process
摘要 The invention relates to pressure gradient processes for forcing infiltration of a reactant gas into a porous structure. The process comprises the steps of partially densifying a porous structure with a pressure gradient CVI/CVD process in which a first potion of the porous structure is subjected to greater pressure than a second portion of the porous structure. The process is suited for the simultaneous CVI/CVD processing of large quantities of aircraft brake.
申请公布号 US6780462(B2) 申请公布日期 2004.08.24
申请号 US20010754829 申请日期 2001.01.03
申请人 GOODRICH CORPORATION 发明人 PURDY MARK J.;RUDOLPH JAMES W.;BOK LOWELL D.
分类号 C04B41/85;C04B35/83;C04B41/87;C23C16/04;C23C16/44;C23C16/452;C23C16/455;C23C16/458;C23C16/52;F16D65/12;F16D69/02;(IPC1-7):C23C16/00 主分类号 C04B41/85
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