发明名称 Crystal growth method, crystal growth apparatus, group-III nitride crystal and group-III nitride semiconductor device
摘要 A crystal growth method, comprising the steps of: a) bringing a nitrogen material into a reaction vessel in which a mixed molten liquid comprising an alkaline metal and a group-III metal; and b) growing a crystal of a group-III nitride using the mixed molten liquid and the nitrogen material brought in by the step a) in the reaction vessel, wherein a provision is made such as to prevent a vapor of the alkaline metal from dispersing out of the reaction vessel.
申请公布号 US6780239(B2) 申请公布日期 2004.08.24
申请号 US20010981848 申请日期 2001.10.16
申请人 RICOH COMPANY, LTD. 发明人 SARAYAMA SEIJI;SHIMADA MASAHIKO;YAMANE HISANORI;AOKI MASATO
分类号 C30B11/00;(IPC1-7):C30B17/00 主分类号 C30B11/00
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