发明名称 |
Crystal growth method, crystal growth apparatus, group-III nitride crystal and group-III nitride semiconductor device |
摘要 |
A crystal growth method, comprising the steps of: a) bringing a nitrogen material into a reaction vessel in which a mixed molten liquid comprising an alkaline metal and a group-III metal; and b) growing a crystal of a group-III nitride using the mixed molten liquid and the nitrogen material brought in by the step a) in the reaction vessel, wherein a provision is made such as to prevent a vapor of the alkaline metal from dispersing out of the reaction vessel. |
申请公布号 |
US6780239(B2) |
申请公布日期 |
2004.08.24 |
申请号 |
US20010981848 |
申请日期 |
2001.10.16 |
申请人 |
RICOH COMPANY, LTD. |
发明人 |
SARAYAMA SEIJI;SHIMADA MASAHIKO;YAMANE HISANORI;AOKI MASATO |
分类号 |
C30B11/00;(IPC1-7):C30B17/00 |
主分类号 |
C30B11/00 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|