发明名称 |
Method of forming a floating gate in a flash memory device |
摘要 |
Disclosed is a method of forming a floating gate in a date flash memory device on which first and second polysilicon films are stacked. After the first polysilicon film is formed, a SiH4 gas is introduced to decompose SiH4 and SiO2 into Si and H2 and Si and O2. A N2 anneal process is then implemented so that the decomposed H2 gas and O2 gas react to a N2 gas and are then outgassed. Next, a SiH4 gas and a PH3 gas are introduced to form the second polysilicon film. A native oxide film within the interface of the first polysilicon film and the second polysilicon film is removed to improve characteristics of the data flash memory device.
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申请公布号 |
US6780743(B2) |
申请公布日期 |
2004.08.24 |
申请号 |
US20030631200 |
申请日期 |
2003.07.31 |
申请人 |
HYNIX SEMICONDUCTOR INC. |
发明人 |
PARK SANG WOOK;LEE SEUNG CHEOL;CHO JUNG IL |
分类号 |
H01L21/302;H01L21/205;H01L21/8247;H01L27/115;H01L29/788;H01L29/792;(IPC1-7):H01L21/824 |
主分类号 |
H01L21/302 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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