| 摘要 |
A temperature drop is be prevented when a plurality of substrates are processed one after another so as to improve a uniformity of process quality between the substrate. An offset temperature value is obtained which is a difference between a temperature of a processing atmosphere at a time immediately before a first one of the substrates is carried into a reaction container and a temperature of the processing atmosphere at a time the temperature has become constant after the substrate are subjected to a heat treatment process one after another. An electric power is supplied to a heater so as to obtain a time period necessary for raising the temperature of a processing atmosphere to a temperature higher than a setting temperature for the heat treatment process by the offset temperature value. The electric power is supplied to the heater for only the obtained time period when the first one of the substrates is carried into the reaction container, and, thereafter, performing an electric power control of the heater based on a temperature detection value of a temperature detecting part provided outside the reaction container.
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