| 摘要 |
In an optical lithography using a mask pattern, or producing a large quantity of three-dimensional articles rapidly with high precision, a predetermined mask pattern is drawn directly on the surface of a resin composition for optical lithography, and the mask pattern is irradiated with light, thereby irradiating the surface of the resin composition containing a photocurable component through the mask pattern The step of forming a cured resin layer corresponding to the drawing is repeated to form a three-dimensional article composed of multiple cured resin layers. Thus, unlike the beam scanning, the curing is uniform in cross section.
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