发明名称 Semiconductor device with adhesion-improvement capacitor and process for producing the device
摘要 A semiconductor device equipped with information storage capacitor comprising a first capacitor electrode, an oxide film, a second capacitor electrode and insulating films containing silicon as a main constituting element, wherein at least one of first and second capacitor electrodes contains as a main constituting element at least one element selected from rhodium, ruthenium, iridium, osmium and platinum, and as an adding element at least one element selected from palladium, nickel, cobalt and titanium, is excellent in adhesiveness between the capacitor electrodes and the insulating films.
申请公布号 US6781172(B2) 申请公布日期 2004.08.24
申请号 US20010800493 申请日期 2001.03.08
申请人 HITACHI, LTD. 发明人 MORIYA HIROSHI;IWASAKI TOMIO;OHTA HIROYUKI;IIJIMA SHINPEI;ASANO ISAMU;OHJI YUZURU;NAKAMURA YOSHITAKA
分类号 H01L27/10;H01L21/02;H01L21/8242;H01L27/108;(IPC1-7):H01L29/76 主分类号 H01L27/10
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