SURFACE TREATMENT DEVICE AND METHOD THEREFOR

摘要

PROBLEM TO BE SOLVED: To provide a surface treatment device and method therefor capable of carrying out a uniform surface treatment even to a substrate with a large area larger than 1m×1m by uniformly generating a plasma between a non-ground electrode and a grounded electrode. SOLUTION: In this surface processor 50 for treating the surface of a substrate arranged in a vacuum container by using a plasma, coaxial cables 100a to 100h used for a power supply system for generating the plasma are constituted of non-flexible first coaxial cables 101a to 101h and 103a to 103h and flexible second coaxial cables 102a to 102h. COPYRIGHT: (C)2004,JPO&NCIPI