发明名称 Catadioptric projection system for 157 nm lithography
摘要 A photolithographic reduction projection catadioptric objective includes a first optical group G1 including an even number of at least four mirrors M1-M6; and a second at least substantially dioptric optical group G2 imageward than the first optical group G1 including a number of lenses E4-E13. The first optical group G1 provides compensative axial aberrative correction for the second optical group G2 which forms an image with a numerical aperture of at least substantially 0.65, and preferably at least 0.70 or 0.75. Six mirror examples are shown.
申请公布号 US2004160666(A1) 申请公布日期 2004.08.19
申请号 US20040771986 申请日期 2004.02.03
申请人 CARL ZEISS SMT AG 发明人 HUDYMA RUSSELL
分类号 G02B13/24;G02B17/08;G03F7/20;H01L21/027;(IPC1-7):G02B5/08 主分类号 G02B13/24
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